Semiconductors, integrated circuit chips and packaging, liquid crystal displays, high-precision circuit boards, optoelectronic devices, various electronic devices, microelectronics industry, large-scale and ultra large scale integrated circuits require a large amount of pure water, high-purity water, and ultrapure water to clean semi-finished and finished products. The higher the integration degree of integrated circuits, the narrower the line width, and the higher the requirements for water quality. At present, China's Ministry of Electronics Industry divides electronic grade water quality technology into five industry levels, namely 18M Ω· cm, 15M Ω· cm, 10M Ω· cm, 2M Ω· cm, and 0.5M Ω· cm, to distinguish different water qualities.

 

    1. Electronics, power, electroplating, lighting appliances, laboratories, food, papermaking, daily chemical products, building materials, paint making, batteries, laboratory testing, biology, pharmaceuticals, petroleum, chemical industry, steel, glass and other fields.

    2. Pure water is used for chemical process water, chemical agents, cosmetics, etc.

    3. Pure water is used for production processes such as monocrystalline silicon, semiconductor chip cutting and manufacturing, semiconductor chips, semiconductor packaging, lead cabinet frames, integrated circuits, liquid crystal displays, conductive glass, picture tubes, circuit boards, optical communication, computer components, capacitor cleaning products, and various electronic components.

 

    1. The modular design of the system is divided into four parts: pretreatment system, reverse osmosis system, EDI system, and terminal water supply system.

    2. The pretreatment system is mainly used to remove suspended solids, turbidity, color, colloids, and some organic matter from the raw water, ensuring that the produced water meets the inlet water quality requirements of the reverse osmosis system.

    3. The reverse osmosis system is mainly used to remove soluble salts, bacteria, heat sources, etc. from raw water, ensuring that the produced water meets the inlet water quality requirements of the EDI system.

    4. The EDI system is mainly used to further remove soluble small molecule salt substances from reverse osmosis produced water, with a resistivity of over 15M Ω. cm.

    5. The terminal water supply system is mainly used to transport qualified water to the water consumption point, and during the transportation process, the EDI is subjected to final ion exchange desalination to achieve a resistivity of 18M Ω. cm or above for the produced water.

    6. The entire system is centrally controlled.